포토마스크 및 포토에칭용 유리 기판

Photomasks are essential tools in the semiconductor industry, serving as templates to transfer intricate patterns onto substrates during photolithography processes. The precision and quality of these photomasks are heavily dependent on the substrates used, which must meet stringent requirements for flatness, transparency, and thermal stability.

글로벌 맞춤형 유리 제조업체, we specialize in supplying high-quality glass for photomask and photoetching applications, with advanced CNC glass machining, cutting, grinding, and polishing capabilities. Our glass substrates are widely used in TFT, IC, LCD, PDP, DOT및 PCB mask production, where precision, clarity, and surface flatness are critical.

We provide both standard and customized solutions for clients across the electronics, display, and semiconductor industries, supporting projects that demand tight dimensional tolerances 그리고 ultra-flat glass surfaces.

Applications for Glass in Masking and Etching Technologies

Our substrates are engineered to perform in environments where optical accuracy, dimensional precision및 durability are essential. Use cases include:

• TFT photomask glass
• IC photomask glass substrates
• LCD mask / photolithography
• PCB photoetching and imaging masks
• PDP photomask glass
• DOT pattern photoetching

These industries require consistent surface characteristics to support high-resolution imaging, circuit transfer및 UV photolithography.

Available Glass Materials for Photomask Fabrication

We provide a wide range of material options for different performance goals, such as transparency, chemical durability, UV resistance및 thermal stability.

Cutting-Edge Glass Processing Capabilities

As a full-service glass machining facility, we offer multiple processing methods to meet industry specifications:

Polishing and Cutting Service for Glass

We perform precision CNC cutting, edge finishing, and customized polishing to exact tolerances.

Flat Grinding / Polishing

Achieve low TTV (total thickness variation) and perfectly flat surfaces for accurate photomask alignment.

Both-Side and One-Side Polishing

Depending on your application, we offer double-sided polishing for parallelism or single-side polishing for bonding use.

Finiture Polishing

We finish glass to ultra clear, low roughness glass substrates, ideal for micro-patterning and lithography alignment.

Industries and Clients We Serve

We proudly support:

• Photomask manufacturing facilities
• Semiconductor R&D labs
• Micro-patterning system integrators
• Flat-panel display producers
• Precision circuit imaging companies
• Government and university cleanrooms

Whether you’re sourcing custom polished glass wafers 또는 quartz photomask substrates, our team ensures your parts are precisely fabricated, packaged clean및 delivered globally on time.

Why Clients Choose Us for CNC Glass Machining

• In-house CNC machining for photomask production
• Advanced metrology for verifying flatness, roughness, and tolerance
• Material advisory based on application (UV, laser, chemical exposure)
• Low MOQ and prototyping support
• Cleanroom-friendly packaging and transport
• Fluent communication and fast quotations

From borosilicate glass for photoetching to ultra-flat glass substrates used in chip and display patterning, we provide unmatched precision and technical support.

Request Your Custom Glass Today

We accept technical drawings, hand sketches, and application briefs. Whether you’re ready for production or still in R&D, we’re here to support you with quick feedback and precision fabrication.

Send us your requirements today and receive a quote in as little as 24 hours.